Cleaning apparatus and method and computer readable medium
AssigneeTokyo Electron Limited
InventorsHiromitsu Nanba, Norihiro Ito
Life of this patent
Estimating the term…
Abstract
A control mechanism of a cleaning apparatus is preset to control the apparatus for a cleaning process or a rinsing process to include delivering a process liquid, which is corresponding one of a cleaning liquid and a rinsing liquid, from a back surface liquid supply nozzle through a liquid delivery port, thereby forming a liquid film on the back surface of a substrate, and then once stopping and then re-starting delivery of the process liquid from the back surface liquid supply nozzle, thereby forming a liquid film also on a portion around the liquid delivery port, so as to process the portion around the liquid delivery port as well as the substrate.
Claims24
A cleaning apparatus comprising:
- a substrate holding member including a rotary plate configured to rotate in a horizontal state and a holding accessory configured to hold a substrate above the rotary plate in a horizontal state to be separated from and integrated with the rotary plate;
- a rotation mechanism configured to rotate the rotary plate along with the substrate;
- a liquid delivery port located near a rotational center of the rotary plate and configured to delivery a liquid onto a center of a back surface of the substrate held on the holding member;
- a back surface liquid supply nozzle connected to the liquid delivery port and configured to supply a cleaning liquid and a rinsing liquid to delivery the cleaning liquid and the rinsing liquid through the liquid delivery port onto the back surface of the substrate;
- a cup configured to surround the substrate held on the substrate holding member;
- and
- a control mechanism configured to control rotation of the substrate and supply of the liquids,
- wherein the control mechanism is preset to control the apparatus to
- perform a cleaning process that comprises rotating the rotary plate along with the substrate held by the holding accessory, while delivering the cleaning liquid from the back surface liquid supply nozzle through the delivery port, thereby forming a liquid film of the cleaning liquid on the back surface of the substrate,
- then sequentially perform a rinsing process that comprises rotating the substrate, while delivering the rinsing liquid from the back surface liquid supply nozzle through the liquid delivery port, thereby forming a liquid film of the rinsing liquid on the back surface of the substrate, and
- then perform a throwing off and drying process that comprises rotating the substrate at predetermined rotation speed, and
- wherein the control mechanism is further preset to control the apparatus for the cleaning process or the rinsing process to comprise delivering a process liquid, which is corresponding one of the cleaning liquid and the rinsing liquid, from the back surface liquid supply nozzle through the liquid delivery port, thereby forming a liquid film on the back surface of the substrate, and then once stopping and then re-starting delivery of the process liquid from the back surface liquid supply nozzle, thereby forming a liquid film also on a portion around the liquid delivery port, so as to process the portion around the liquid delivery port as well as the substrate.
A cleaning method performed in a cleaning apparatus comprising a substrate holding member including a rotary plate configured to rotate in a horizontal state and a holding accessory configured to hold a substrate above the rotary plate in a horizontal state to be separated from and integrated with the rotary plate, a rotation mechanism configured to rotate the rotary plate along with the substrate, a liquid delivery port located near a rotational center of the rotary plate and configured to delivery a liquid onto a center of a back surface of the substrate held on the holding member, a back surface liquid supply nozzle connected to the liquid delivery port and configured to supply a cleaning liquid and a rinsing liquid to delivery the cleaning liquid and the rinsing liquid through the liquid delivery port onto the back surface of the substrate, and a cup configured to surround the substrate held on the substrate holding member,
- the method comprising:
- holding the substrate on the substrate holding member;
- rotating the rotary plate along with the substrate held thereon;
- performing a cleaning process that comprises rotating the substrate, while delivering the cleaning liquid from the back surface liquid supply nozzle through the delivery port, thereby forming a liquid film of the cleaning liquid on the back surface of the substrate;
- then sequentially performing a rinsing process that comprises rotating the substrate, while delivering the rinsing liquid from the back surface liquid supply nozzle through the liquid delivery port, thereby forming a liquid film of the rinsing liquid on the back surface of the substrate;
- and
- then performing a throwing off and drying process that comprises rotating the substrate at predetermined rotation speed,
- wherein the cleaning process or the rinsing process comprises delivering a process liquid, which is corresponding one of the cleaning liquid and the rinsing liquid, from the back surface liquid supply nozzle through the liquid delivery port, thereby forming a liquid film on the back surface of the substrate, and then once stopping and then re-starting delivery of the process liquid from the back surface liquid supply nozzle, thereby forming a liquid film also on a portion around the liquid delivery port, so as to process the portion around the liquid delivery port as well as the substrate.
A computer readable medium that stores a computer program for execution on a processor used for a cleaning apparatus comprising a substrate holding member including a rotary plate configured to rotate in a horizontal state and a holding accessory configured to hold a substrate above the rotary plate in a horizontal state to be separated from and integrated with the rotary plate, a rotation mechanism configured to rotate the rotary plate along with the substrate, a liquid delivery port located near a rotational center of the rotary plate and configured to delivery a liquid onto a center of a back surface of the substrate held on the holding member, a back surface liquid supply nozzle connected to the liquid delivery port and configured to supply a cleaning liquid and a rinsing liquid to delivery the cleaning liquid and the rinsing liquid through the liquid delivery port onto the back surface of the substrate, and a cup configured to surround the substrate held on the substrate holding member,
- the computer program, when executed by the processor, controlling the cleaning apparatus to perform a cleaning method comprising:
- holding the substrate on the substrate holding member;
- rotating the rotary plate along with the substrate held thereon;
- performing a cleaning process that comprises rotating the substrate, while delivering the cleaning liquid from the back surface liquid supply nozzle through the delivery port, thereby forming a liquid film of the cleaning liquid on the back surface of the substrate;
- then sequentially performing a rinsing process that comprises rotating the substrate, while delivering the rinsing liquid from the back surface liquid supply nozzle through the liquid delivery port, thereby forming a liquid film of the rinsing liquid on the back surface of the substrate;
- and
- then performing a throwing off and drying process that comprises rotating the substrate at predetermined rotation speed,
- wherein the cleaning process or the rinsing process comprises delivering a process liquid, which is corresponding one of the cleaning liquid and the rinsing liquid, from the back surface liquid supply nozzle through the liquid delivery port, thereby forming a liquid film on the back surface of the substrate, and then once stopping and then re-starting delivery of the process liquid from the back surface liquid supply nozzle, thereby forming a liquid film also on a portion around the liquid delivery port, so as to process the portion around the liquid delivery port as well as the substrate.
Dependencies are inferred from the claim text.