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OwnerKenneth S. Collins, Andrew N. Nguyen +5inventors
InventorsKenneth S. Collins, Andrew N. Nguyen, Kartik Ramaswamy, Hiroji Hanawa, Douglas A. Buchberger, Daniel J. Hoffman, Amir Al-Bayati
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Embodiments described herein generally provide a toroidal plasma source, a plasma channeling device, a showerhead, and a substrate support assembly for use in a plasma chamber. The toroidal plasma source, plasma channeling device, showerhead, and substrate support assembly are adapted to improve the usable lifetime of the plasma chamber, as well as reduce assembly cost, increase the plasma chamber reliability, and improve device yield on the processed substrates.
A toroidal plasma source, comprising:
A plasma channeling apparatus, comprising:
A gas distribution plate, comprising:
A cathode assembly for a substrate support, comprising:
Dependencies are inferred from the claim text.