Controlling device for substrate processing apparatus and method therefor

A control method for controlling a substrate processing apparatus that performs a specified process on a substrate, comprising:

• storing in a storage unit a specified target value that serves as a control value when the specified process is performed on the substrate;
• causing a measuring device to measure measurement information including a processing state of the substrate that is processed by the substrate processing apparatus;
• receiving the measurement information;
• computing a feedback value that corresponds to a processed state of the substrate processed in the current cycle, based on pre-processing and post-processing measurement information for the substrate processed in the current cycle within the received measurement information;
• computing a feedback value change value between the current computed feedback value and at least any one of feedback values that was computed before the current cycle;
• determining whether or not to discard the current computed feedback value by comparing the computed feedback value change value to a given threshold value;
• and
• in a case where it is determined that the current computed feedback value will not be discarded, using the current computed feedback value in updating the target value that is stored in the storage unit.

A storage medium that stores a control program for a substrate processing apparatus that performs a specified process on a substrate, to control the substrate processing apparatus by executing the control program with a computer, the control program comprising:

• a module stores in a storage unit a specified target value that serves as a control value when the specified process is performed on the substrate;
• a module that causes a measuring device to measure measurement information including a processing state of the substrate that is processed by the substrate processing apparatus, and that receives the measurement information;
• a module that computes a feedback value that corresponds to a processed state of the substrate processed in the current cycle, based on pre-processing and post-processing measurement information for the substrate processed in the current cycle within the received measurement information, and that also computes a feedback value change value between the current computed feedback value and at least any one of feedback values that was computed before the current cycle;
• a module that determines whether or not to discard the current computed feedback value by comparing the computed feedback value change value to a given threshold value;
• and
• a module that, in a case where it is determined that the current computed feedback value will not be discarded, uses the current computed feedback value in updating the target value that is stored in the storage unit.