Positive Dry Film Photoresist and Composition For Preparing the Same
OwnerByoung-Kee Kim, Se-Hyung Park +3inventors
InventorsByoung-Kee Kim, Se-Hyung Park, Dal-Seok Byun, Seog-Jeong Song, Jong-Min Park
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Abstract
A positive type photoresist resin film contains a support film and a positive photoresist resin layer laminated over the support film. The photoresist layer may be formed from a composition containing a resin, a photosensitive compound, and a first solvent having a boiling point sufficiently high such that a second solvent can be removed from the composition by heating while the first solvent is substantially retained in the composition.
Claims28
A composition for a positive photoresist, comprising:
- a thermosetting resin;
- a positive photosensitive compound;
- and
- a first solvent having a boiling point sufficiently high such that a second solvent can be removed from the composition by heating while the first solvent is substantially retained in the composition.
A positive dry film photoresist, comprising:
- a supporting film;
- and
- a positive photoresist layer over the supporting film, the positive photoresist layer being composed of a thermosetting resin and a positive photosensitive compound, wherein the positive photoresist layer is formed by a process of:
- applying to the supporting film a mixture comprising the thermosetting resin, the positive photosensitive compound, a first solvent and a second solvent, the first solvent having a boiling point sufficiently high such that that second solvent can be substantially removed from the composition by heating while the first solvent is substantially retained in the composition;
- and
- heating the composition until the second solvent is substantially removed.
A method for forming a positive dry film photoresist, comprising:
- providing a supporting film;
- applying to the supporting film a mixture comprising a thermosetting resin, a positive photosensitive compound, a first solvent and a second solvent, the first solvent having a boiling point sufficiently high such that that second solvent can be substantially removed from the composition by heating while the first solvent is substantially retained in the composition;
- and
- heating the composition until the second solvent is substantially removed.
Dependencies are inferred from the claim text.