Data preparation for multiple mask printing
AssigneeMentor Graphics Corporation
InventorsJea-Woo Park, Emile Y. Sahouria
Life of this patent
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Abstract
A method for preparing data to create two or more masks required to print a desired feature pattern with a multiple mask technique. In one embodiment of the invention, a target feature pattern is separated into two or more groups or data layers with a coloring algorithm. Coloring conflicts or adjacent features that are within a predetermined distance of each other and are assigned to the same group or data layer are identified. Cutting boxes are added to a feature to divide a feature into two or more smaller features. A coloring algorithm is re-applied to the layout including the cutting boxes to assign the features into different groups or data layers. Data in each group or data layer is used to define a mask to print the target feature pattern.
Claims7
A method of preparing data to create two or more mask layouts for the photolithographic printing of a desired pattern of features on a wafer, comprising:
- receiving data representative of a desired layout design including a number of features to be created on a wafer;
- designating adjacent features in the desired layout design into two or more groups;
- identifying features that are assigned to the same group that are within a predetermined distance of each other;
- introducing one or more cut points to an identified feature to break the identified feature into smaller features;
- re-designating the adjacent features in the desired layout design including the cut points into two or more groups;
- and
- assigning the features in each of the two or more groups for use in making separate mask layouts.
Dependencies are inferred from the claim text.