Lithographic apparatus, device manufacturing method and computer program product
AssigneeASML Netherlands B.V.
InventorJohannes Wilhelmus De Klerk
Life of this patent
Estimating the term…
Abstract
Additional vibrations are added during the exposure of a substrate so that vibrations occurring during exposure of a plurality of areas on the substrate are substantially uniform. This may improve CD uniformity.
Claims23
A lithographic projection apparatus arranged to project a pattern from a patterning device onto a substrate, the apparatus comprising:
- a substrate table configured to hold a substrate;
- a positioning system configured to move the substrate table for exposure of a plurality of target portions on the substrate;
- a control system configured to control the positioning system to increase a level of vibration experienced by the substrate table in a direction during exposure of a target portion of the plurality of target portions to substantially equal a level of vibration experienced or expected to be experienced by the substrate table in the direction during exposure of another target portion of the plurality of target portions.
A device manufacturing method, comprising:
- projecting a patterned beam of radiation onto a substrate;
- and
- while projecting the patterned beam, increasing a level of vibration experienced by the substrate table in a direction during exposure of a target portion of a plurality of target portions on the substrate to substantially equal a level of vibration experienced or expected to be experienced by the substrate table in the direction during exposure of another target portion of the plurality of target portions.
A computer program product comprising program code that, when executed by a computer system forming part of a lithographic apparatus, instructs the computer system to control the apparatus to perform a device manufacturing method, the method comprising:
- projecting a patterned beam of radiation onto a substrate;
- while projecting the patterned beam, increasing a level of vibration experienced by the substrate table in a direction during exposure of a target portion of a plurality of target portions on the substrate to substantially equal a level of vibration experienced or expected to be experienced by the substrate table in the direction during exposure of another target portion of the plurality of target portions.
Dependencies are inferred from the claim text.