Projection optical apparatus, exposure method and apparatus, photomask, and device and photomask manufacturing method

A projection optical apparatus for forming a magnified image of a first object on a second object, wherein the first object and the second object are relatively moved in a predetermined scanning direction, the projection optical apparatus comprising:

• first and second projection optical systems including an enlargement magnification, each of the first and second projection optical systems forming an image of part of the first object on the second object;
• wherein when two arbitrary view points respectively corresponding to the first and second projection optical systems are defined on the first object, two conjugate points respectively corresponding to the two arbitrary points are defined on the second object, a first line segment is obtained by connecting the two view points, and a second line segment is obtained by connecting the two conjugate points, the first and second projection optical systems are arranged so that the first segment forms one side of a first figure, which is related with part of the first object, and the second line segment forms one side of a second figure, which is related with an image of part of the first object and which is a similar figure of the first figure of which magnification ratio relative to the first figure is the enlargement magnification;
• and
• a light beam transmission member which transmits a light beam from an arbitrary view point corresponding to at least one of the first and second projection optical systems on the first object to the corresponding conjugate point on the second object by shifting the light beam from the view point in at least a direction orthogonal to the scanning direction.