Lithographic apparatus and method
AssigneeASML Netherlands B.V.
InventorsHernes Jacobs, Eva Mondt, Alexander Nikolov Zdravkov
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Abstract
A lithographic apparatus is disclosed that includes a seal provided in a substrate table, the seal being actuatable from an open configuration to a closed configuration, the closed configuration being such that when a substrate is located on the substrate table, the seal closes a gap between the substrate and the substrate table.
Claims22
A lithographic apparatus, comprising:
- a substrate table arranged to hold a substrate;
- a projection system configured to project a patterned beam of radiation onto the substrate;
- a liquid supply system configured to provide a liquid to a space between the projection system and the substrate table;
- and
- a seal provided in the substrate table, the seal being actuatable from an open configuration to a closed configuration, the closed configuration being such that when a substrate is located on the substrate table, the seal substantially closes a gap between the substrate and the substrate table.
A substrate table arranged to hold a lithographic substrate, a seal being provided in the substrate table, the seal being actuatable from an open configuration to a closed configuration, the closed configuration being such that when a substrate is located on the substrate table, the seal substantially closes a gap between the substrate and the substrate table.
A lithographic method, comprising:
- providing a substrate on substrate table;
- actuating a rotatable ring and lip such that they substantially close a gap between the substrate and the substrate table;
- providing a liquid to a space between a projection system and the substrate table;
- projecting a pattern onto the substrate via the projection system;
- actuating the rotatable ring such that the gap between the substrate and the substrate table is reopened;
- and
- removing the substrate from the substrate table.
Dependencies are inferred from the claim text.