Liquid Removing Apparatus, Exposure Apparatus and Device Fabricating Method
AssigneeNikon Corporation
InventorTakeyuki Mizutani
Life of this patent
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Abstract
A liquid removing apparatus (1) evacuates a gas present in a specified space formed on a rear surface (Pb) side of a substrate (P) taken out from a substrate holder (PH), to remove liquid adhered to the rear surface (Pb) of an exposure target substrate (P).
Claims26
A liquid removing apparatus that removes liquid adhered to an exposure target substrate irradiated with exposure light through the liquid and taken out from a substrate holder, wherein a specified space is formed on a rear surface side of the exposure target substrate taken out from the substrate holder and wherein the liquid adhered to a rear surface of the exposure target substrate is removed by evacuating a gas present in the specified space through a suction port.
Dependencies are inferred from the claim text.