Power semiconductor device
AssigneeABB Technology AG
InventorsMunaf Rahimo, Peter Streit
Life of this patent
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AssigneeABB Technology AG
InventorsMunaf Rahimo, Peter Streit
Estimating the term…
The power semiconductor device with a four-layer npnp structure can be turned-off via a gate electrode. The first base layer comprises a cathode base region adjacent to the cathode region and a gate base region adjacent to the gate electrode, but disposed at a distance from the cathode region. The gate base region has the same nominal doping density as the cathode base region in at least one first depth, the first depth being given as a perpendicular distance from the side of the cathode region, which is opposite the cathode metallization. The gate base region has a higher doping density than the cathode base region and/or the gate base region has a greater depth than the cathode base region in order to modulate the field in blocking state and to defocus generated holes from the cathode when driven into dynamic avalanche.
Power semiconductor device with a semiconductor substrate and a cathode metallization being formed on a cathode side and an anode metallization being formed on an anode side opposite the cathode side, said semiconductor substrate comprising a four-layer structure with layers of different conductivity types,
Method for manufacturing a semiconductor device with a semiconductor substrate and a cathode metallization being formed on a cathode side and an anode metallization being formed on an anode side opposite the cathode side, the method comprising the following steps:
Dependencies are inferred from the claim text.