Film formation apparatus, film formation method, manufacturing method and titanium film
AssigneeAdvantest Corporation
InventorTOSHIYUKI ARAKI
Life of this patent
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Abstract
A film formation apparatus that forms a metal film on a substrate is provided. The film formation apparatus includes: a chamber that holds therein the substrate; a material holding section that holds a metal material as a material for the metal film in the chamber; a film formation section that forms the metal film on the substrate by using the metal material; an introduction section that introduces gas into the chamber; and a partial pressure control section that controls the partial pressure of the gas in the chamber to cause the film formation section to form the metal film having a desired density.
Claims16
A film formation apparatus that forms a metal film on a substrate, comprising:
- a chamber that holds therein the substrate;
- a material holding section that holds a metal material as a material for the metal film in the chamber;
- a film formation section that forms the metal film on the substrate by using the metal material;
- an introduction section that introduces gas into the chamber;
- and
- a partial pressure control section that controls the partial pressure of the gas in the chamber to cause the film formation section to form the metal film having a desired density.
A film formation method for forming a metal film on a substrate, comprising:
- holding the substrate inside a chamber;
- holding a metal material as a material for the metal film in the chamber by a material holding section;
- forming the metal film on the substrate by using the metal material;
- introducing gas into the chamber by an introduction section;
- and
- controlling a partial pressure of the gas in the chamber to cause a film formation section to form the metal film having a desired density.
A manufacturing method for manufacturing a substrate having a surface on which a metal film is formed, comprising:
- holding a substrate in a chamber;
- holding a metal material as a material for the metal film in the chamber;
- forming the metal film on the substrate by using the metal material;
- introducing gas into the chamber;
- and
- controlling the partial pressure of the gas in the chamber to form the metal film having a desired density by the step of forming the film.
Dependencies are inferred from the claim text.