Systems and Methods for Single Integrated Substrate Cleaning and Rinsing
AssigneeNano OM, LLC
InventorSuraj Puri
Life of this patent
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Abstract
Inventive methods and systems of cleaning patterned integrated circuit (“IC”) substrates are described. The cleaning methods of the present invention include: (1) providing the patterned integrated circuit substrate having thereon poly silicon lines adjacent to each other; (2) charging a solution, which contains at least a solute selected to promote cleaning of the patterned integrated circuit substrate, to produce a charged solution, wherein at least a portion of the solute is present as clusters in the charged solution; and (3) conveying the charged solution for cleaning the patterned integrated circuit substrate.
Claims28
A method for cleaning a patterned integrated circuit substrate, comprising:
- providing said patterned integrated circuit substrate having thereon poly silicon lines adjacent to each other;
- charging a solution, which contains at least a solute selected to promote cleaning of said integrated circuit substrate, to produce a charged solution, wherein at least a portion of said solute is present as clusters in said charged solution;
- and
- conveying said charged solution for cleaning said patterned integrated circuit substrate.
A system for cleaning a patterned integrated circuit substrate, comprising:
- a charging chamber for holding a solution, which contains at least a solute selected to promote cleaning of said patterned integrated circuit substrate;
- a first acoustic energy source capable of vibrating said solution in said charging chamber to produce a charged solution, wherein at least a portion of said solute is present as clusters in said charged solution;
- and
- a cleaning assembly for cleaning said patterned integrated circuit substrate by applying said charged solution to a surface of said patterned integrated circuit substrate.
A method for rinsing a patterned integrated circuit substrate, comprising:
- providing said patterned integrated circuit substrate having thereon poly silicon lines adjacent to each other;
- cleaning the patterned integrated circuit substrate
- charging a solution, which contains at least a solute selected to promote cleaning of said patterned integrated circuit substrate, to produce a charged solution, wherein at least a portion of said solute is present as clusters in said charged solution;
- and
- conveying said charged solution for rinsing said patterned integrated circuit substrate.
Dependencies are inferred from the claim text.