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US 2008/0156353 A1Published application
Apparatus for removing haze in photo mask and method for removing haze in a photo mask
AssigneeHynix Semiconductor Inc.
InventorMun Sik Kim
Life of this patent
Estimating the term…
Abstract
An apparatus for removing haze in a photo mask includes sealed chamber having a bake module disposed therein to support a photo mask, a reactant gas feed line to feed a reactant gas into the chamber, and a discharge device to discharge impurities in the chamber to the outside.
Claims9
An apparatus for removing haze in a photo mask comprising:
- a chamber;
- a bake module disposed in the chamber to support the photo mask;
- a reactant gas feed line to feed a reactant gas into the chamber;
- and
- a discharge device to discharge impurities in the chamber to the outside of the chamber.
2 more elements
A method for removing haze in a photo mask comprising:
- loading a photo mask into a chamber;
- increasing a temperature of the loaded photo mask above a predetermined temperature;
- feeding a reactant gas into the chamber, thereby reacting the reactant gas and impurities present on the increased temperature photo mask to form a reaction product;
- and
- discharging the reaction product of the reactant gas and the impurities to the outside of the chamber.
2 more elements
Dependencies are inferred from the claim text.