Apparatus and method for plasma processing
AssigneeFOI Corporation
InventorsGeorgy K. Vinogradov, Vladimir M. Menagarishvili
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Abstract
The present invention discloses an apparatus for plasma processing comprising of a chamber for plasma processing with an external wall, and at least one induction coil for providing a radio frequency induction field that is adjacent to the chamber. It further includes an end terminal of the induction coil that is connected to a radio frequency power supply, another end terminal of the induction coil that is open-ended, and a grounded terminal of the induction coil that is located at substantially central position of the induction coil.
Claims17
An apparatus for plasma processing, comprising:
- a chamber for plasma processing with an external wall;
- at least one inductor for providing a radio frequency induction field that is adjacent to the chamber;
- an end terminal of the inductor that is connected to a radio frequency power supply;
- another end terminal of the inductor that is open-ended;
- and
- a grounded terminal of the inductor that is located at substantially central position of the inductor.
An apparatus for plasma processing, comprising:
- a cylindrical chamber for plasma processing with an external wall;
- a gas inlet for introducing process gas into the cylindrical chamber;
- at least one induction coil for providing a radio frequency induction field that is cylindrical spiral and adjacently surrounds a part of the cylindrical chamber;
- an end terminal of the induction coil that is connected to a radio frequency power supply;
- another end terminal of the induction coil that is open-ended;
- and
- a grounded terminal of the induction coil that is located at geometrically central position of the induction coil.
A method for plasma processing, comprising:
- generating plasma by an apparatus, comprising:
- a chamber for plasma processing with an external wall;
- at least one inductor for providing a radio frequency induction field that is adjacent to the chamber;
- an end terminal of the inductor that is connected to a radio frequency power supply;
- another end terminal of the inductor that is open-ended,
- a grounded terminal of the inductor that is located at substantially central position of the inductor;
- and
- processing a workpiece by using the plasma in the chamber.
Dependencies are inferred from the claim text.