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US 2008/0077362 A1Published application
Methods and apparatus for using an optically tunable soft mask to create a profile library
AssigneeTokyo Electron Limited
InventorsJames E. Willis, James E. Klekotka
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Abstract
The present invention provides methods and system for improving the accuracy of measurements made using optical metrology. The present invention relates to methods and systems for changing the optical properties of tunable resists that can be used in the production of electronic devices such as integrated circuits. Further, the invention provides methods and systems for using a modifiable resist layer that provides a first set of optical properties before exposure and a second set of optical properties after exposure.
Claims39
A method of creating an enhanced profile library, the method comprising:
- creating an enhanced reference structure in an optically tunable soft mask (OTSM) layer on a substrate;
- measuring the enhanced reference structure with a metrology device, the measurement generating enhanced reference data comprising an enhanced reference signal, or an enhanced reference profile shape, or enhanced reference profile parameters, or any combination thereof;
- comparing the enhanced reference signal, or the enhanced reference profile shape, or the enhanced reference profile parameters, or any combination thereof to data in an enhanced profile library, the data in the enhanced profile library being characterized by an enhanced set of wavelengths;
- and either
- identifying the enhanced reference structure using the enhanced profile library data associated with a matching condition when a matching condition is found or applying a first corrective action if a matching condition cannot be found.
2 more elements
A system for creating an enhanced profile library, the system comprising:
- a lithography subsystem for creating an enhanced reference structure in an optically tunable soft mask (OTSM) layer on a substrate;
- a metrology subsystem for measuring the enhanced reference structure using a metrology device, the measurement generating enhanced reference data comprising an enhanced reference signal, or an enhanced reference profile shape, or enhanced reference profile parameters, or any combination thereof;
- and
- a controller for comparing the enhanced reference signal, or the enhanced reference profile shape, or the enhanced reference profile parameters, or any combination thereof to data in an enhanced profile library, the data in the enhanced profile library being characterized by an enhanced set of wavelengths;
- and for either identifying the enhanced reference structure using the enhanced profile library data associated with a matching condition when a matching condition is found or for applying a first corrective action if a matching condition cannot be found.
2 more elements
A method of creating an enhanced profile library, the method comprising:
- creating an enhanced reference structure in material layer on a substrate using an optically tunable soft mask (OTSM) layer as a mask;
- measuring the enhanced reference structure with a metrology device, the measurement generating enhanced reference data comprising an enhanced reference signal, or an enhanced reference profile shape, or enhanced reference profile parameters, or any combination thereof;
- comparing the enhanced reference signal, or the enhanced reference profile shape, or the enhanced reference profile parameters, or any combination thereof to data in an enhanced profile library, the data in the enhanced profile library being characterized by an enhanced set of wavelengths;
- and either
- identifying the enhanced reference structure using the enhanced profile library data associated with a matching condition when a matching condition is found or applying a first corrective action if a matching condition cannot be found.
2 more elements
A method of creating an enhanced profile library comprising:
- directing an enhanced incident beam on a first enhanced structure in an Optically Tunable Soft Mask (OTSM) layer, the first enhanced structure being formed by modifying at least one optical property of the OTSM layer after developing the OTSM layer, wherein an enhanced metrology tool is used to direct the enhanced incident beam, the enhanced metrology tool generating enhanced measurement data comprising an enhanced profile signal, or an enhanced profile shape, or enhanced profile parameters, or any combination thereof;
- calculating a first enhanced simulated signal, wherein the first enhanced simulated signal corresponds to a hypothetical profile of the first enhanced structure, wherein the hypothetical profile includes a portion of the modified OTSM therein;
- calculating a first difference between the enhanced profile signal and the first enhanced simulated signal, the enhanced profile signal and the first enhanced simulated signal being characterized by an enhanced set of wavelengths;
- comparing the first difference to a first enhanced profile library creation criteria;
- and either
- identifying the first enhanced structure using the hypothetical profile and storing in the enhanced library the first enhanced simulated signal, the hypothetical profile of the first enhanced structure, including data for the modified OTSM portion if the first enhanced profile library creation criteria is met or applying a first corrective action if the first enhanced profile library creation criteria is not met.
3 more elements
A method of creating an enhanced profile library, the method comprising:
- creating an enhanced reference structure in a substrate using an optically tunable soft mask (OTSM) layer;
- measuring the enhanced reference structure with a metrology device, the measurement generating enhanced reference data comprising an enhanced reference signal, or an enhanced reference profile shape, or enhanced reference profile parameters, or a combination thereof;
- comparing the enhanced reference signal, or the enhanced reference profile shape, or the enhanced reference profile parameters, or any combination thereof to data in an enhanced profile library, the data in the enhanced profile library being characterized by an enhanced set of wavelengths;
- and either
- identifying the enhanced reference structure using the enhanced profile library data associated with a matching condition when a matching condition is found or applying a first corrective action if a matching condition cannot be found.
2 more elements
Dependencies are inferred from the claim text.