Rework methodology that preserves gate performance

Abstract

In one embodiment, a method of manufacturing an integrated circuit that comprises forming a circuit layer over a substrate, forming a resist layer on the circuit layer, and subjecting the resist layer to a rework process that includes exposing the resist layer to an organic wash. In another embodiment, the method of manufacturing an integrated circuit comprises forming a circuit layer over a substrate, forming a priming layer on the circuit layer, and subjecting the resist layer to the rework process. The reworking process includes exposing the substrate to a mild plasma ash to substantially remove portions of the resist layer but leave the priming layer.

Dependencies are inferred from the claim text.