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US 2008/0076074 A1Published application
Method for double patterning a developable anti-reflective coating
AssigneeTokyo Electron Limited
InventorShannon W. Dunn
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AssigneeTokyo Electron Limited
InventorShannon W. Dunn
Estimating the term…
A method for double patterning a thin film on a substrate is described. The method includes forming the thin film to be patterned on the substrate, forming a developable anti-reflective coating (ARC) layer on the thin film, and forming a layer of photo-resist on the ARC layer. Thereafter, the layer of photo-resist and the ARC layer are imaged with a first image pattern, and developed, thus forming the first image pattern in the ARC layer. The photo-resist is removed and another layer of photo-resist is formed on the ARC layer. Thereafter, the other layer of photo-resist and the ARC layer are imaged with a second image pattern, and developed, thus forming the second image pattern in the ARC layer. The other photo-resist layer is removed and a double patterned ARC layer remains for etching the underlying thin film.
A method of double patterning a thin film on a substrate, comprising:
A computer readable medium containing program instructions for execution on a control system, which when executed by the control system, cause a patterning system to perform the steps of:
Dependencies are inferred from the claim text.