Fabrication of self assembling nano-structures

A method for forming patterned surfaces including the steps of:

• forming a plurality of line on a surface of a substrate forming regions between the lines, where a line spacing, a line thickness and a line height are adjusted to support self-assembly nano-structure formation to produce well ordered or substantially defect free patterned self-assembled nano-structures within or on the regions;
• and
• treating to the surface with a composition sufficient to self-assemble nano-structures within the regions, where the lines force the self-assembly to proceed in such as way that the nano-structures are well ordered or substantially defect free patterns within or on the regions.

A surface comprising a plurality of regions defined by a plurality of lines and a plurality of self-assembled nano-structures within or on each region, where the nano-structures are well ordered or substantially defect free within or on each region.

A surface comprising:

• a plurality of first regions defined by a plurality of first lines and a plurality of first self-assembled nano-structures within or on each first region, where the first nano-structures form a first pattern within or on each first region that is well ordered or substantially defect free, and
• a plurality of second regions defined by a plurality of second lines and a plurality of second self-assembled nano-structures within or on each second region, where the second nano-structures form a second pattern within or on each first region that is not well ordered or substantially defect free,
• where the pluralities are the same or different.