Method for drying applied film and drying apparatus
AssigneeFUJIFILM Corporation
InventorNobuo HAMAMOTO
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Abstract
The present invention provides a method for drying an applied film formed by applying an application liquid containing an organic solvent to a traveling long support medium, wherein the temperature Tb of the long support medium before application is not less than 2° C. lower than the temperature Tc of the application liquid and the wind velocity in the vicinity of the applied film after application is not more than 0.5 m/s, thereby the applied film is dried uniformly in the initial drying of the applied film.
Claims13
A method for drying an applied film formed by applying an application liquid containing an organic solvent to a traveling long support medium, wherein
- the temperature Tb of the long support medium before application is not less than 2° C. lower than the temperature Tc of the application liquid and the wind velocity in the vicinity of the applied film after application is not more than 0.5 m/s.
An apparatus for drying an applied film formed by applying an application liquid containing an organic solvent to a traveling long support medium by use of an applicator, comprising:
- a roll the surface temperature of which is controlled so that the temperature Tb of the long support medium is not less than 2° C. lower than the temperature Tc of the application liquid;
- a drying apparatus main body that is provided immediately behind the applicator and forms a drying zone enclosing an applied film surface of the traveling long support medium to be dried;
- and
- a unidirectional airflow generating device that generates a drying wind having a unidirectional flow that flows in the drying zone from the one-end side in the width direction of the long support medium to the other-end side thereof and having a wind velocity of not more than 0.5 m/s in the vicinity of the applied film after application.
Dependencies are inferred from the claim text.