Measurement apparatus and measurement method
AssigneeFujitsu Limited
InventorsKatsumi Fujihara, Hidetoshi Ohba
Life of this patent
Estimating the term…
Loading patent…
AssigneeFujitsu Limited
InventorsKatsumi Fujihara, Hidetoshi Ohba
Estimating the term…
According to the present invention, there is provided a measurement apparatus having a measurement light source for emitting measurement light, a projection unit on which reflected light formed when the measurement light is reflected from the mirror plane is projected as a projected light spot, an image pickup unit for picking up an image of the projection unit on which the reflected light is projected as the projected light spot, a control unit for controlling an inclination of the mirror plane and a measurement unit for measuring a quantity of movement of the projected light spot, which moves according to a change of the inclination of the mirror plane, on the basis of the image of the projection unit. This enables the measurement of a deflection characteristic of a mirror system having the mirror plane variable to arrange the inclination within a short period of time and with high accuracy.
A measurement apparatus, which measures a characteristic of a mirror system having a mirror plane variable to arrange an inclination, comprising:
A measurement method of measuring a characteristic of a mirror system having a mirror plane variable to arrange an inclination, comprising:
A mirror system manufacturing method of manufacturing a mirror system having a mirror plane variable to arrange an inclination, comprising:
Dependencies are inferred from the claim text.