Perovskite oxide, process for producing the perovskite oxide, piezoelectric body, piezoelectric device, and liquid discharge device
AssigneeFUJIFILM Corporation
InventorsYukio Sakashita, Tsutomu Sasaki
Life of this patent
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Abstract
A process for producing a piezoelectric oxide having a composition (A, B, C) (D, E, F)O3, where each of A, B, C, D, E, and F represents one or more metal elements. The composition is determined so as to satisfy the conditions (1), (2), (3), and (4), 0.98≦TF(P)≦1.01, (1) TF(ADO3)>1.0, (2) TF(BEO3)<1.0, and (3) TF(BEO3)<TF(CFO3)<TF(ADO3), (4) where TF(P) is the tolerance factor of the perovskite oxide, and TF(ADO3), TF(BEO3), and TF(CFO3) are respectively the tolerance factors of the compounds ADO3, BEO3, and CFO3.
Claims59
A process for producing a piezoelectric oxide having a composition expressed by a compositional formula,
- (A, B, C) (D, E, F)O3,
- where each of A, B, C, D, E, and F represents one or more metal elements, A, B, and C represent A-site elements, D, E, and F represent B-site elements, O represents the oxygen atom, the B-site elements D, E, and F are different when two or all of the A-site elements A, B, and C are identical, the A-site elements A, B, and C are different when two or all of the B-site elements D, E, and F are identical, and the ratio of each of the total molar amount of the A-site elements and the total molar amount of the B-site elements to the molar amount of oxygen atoms may deviate from 1:3 within a range in which the composition expressed by the compositional formula (A, B, C) (D, E, F)O3 can form a perovskite structure;
- wherein
- the composition of said perovskite oxide satisfies the conditions (1), (2), (3), and (4),
- 0.98≦TF(P)≦1.01, (1)
- TF(ADO3)>1.0, (2)
- TF(BEO3)<1.0, and (3)
- TF(BEO3)<TF(CFO3)<TF(ADO3), (4)
- where TF(P) is a tolerance factor of the piezoelectric oxide expressed by the compositional formula (A, B, C) (D, E, F)O3, TF(ADO3) is a tolerance factor of a compound expressed by a compositional formula ADO3, TF(BEO3) is a tolerance factor of a compound expressed by a compositional formula BEO3, and TF(CFO3) is a tolerance factor of a compound expressed by a compositional formula CFO3.
A piezoelectric oxide having a composition expressed by a compositional formula,
- (A, B, C) (D, E, F)O3,
- where each of A, B, C, D, E, and F represents one or more metal elements, A, B, and C represent A-site elements, D, E, and F represent B-site elements, O represents the oxygen atom, the B-site elements D, E, and F are different when two or all of the A-site elements A, B, and C are identical, the A-site elements A, B, and C are different when two or all of the B-site elements D, E, and F are identical, and the ratio of each of the total molar amount of the A-site elements and the total molar amount of the B-site elements to the molar amount of oxygen atoms may deviate from 1:3 within a range in which the composition expressed by the compositional formula (A, B, C) (D, E, F)O3 can form a perovskite structure;
- wherein
- the composition of said perovskite oxide satisfies the conditions (1), (2), (3), and (4),
- 0.98≦TF(P)≦1.01, (1)
- TF(ADO3)>1.0, (2)
- TF(BEO3)<1.0, and (3)
- TF(BEO3)<TF(CFO3)<TF(ADO3), (4)
- where TF(P) is a tolerance factor of the piezoelectric oxide expressed by the compositional formula (A, B, C) (D, E, F)O3, TF(ADO3) is a tolerance factor of a compound expressed by a compositional formula ADO3, TF(BEO3) is a tolerance factor of a compound expressed by a compositional formula BEO3, and TF(CFO3) is a tolerance factor of a compound expressed by a compositional formula CFO3.
A piezoelectric oxide having;
- a composition at or near a morphotropic phase boundary;
- and
- a mixed-crystal structure composed of at least two first crystal phases which are ones of tetragonal, orthorhombic, and rhombohedral phases, and at least one second crystal phase which is at least one of cubic and pseudocubic phases.
A piezoelectric oxide having;
- a composition at or near a morphotropic phase boundary;
- and
- a structure which exhibits a high-resolution X-ray diffraction profile including a first diffraction peak corresponding to a tetragonal phase, a second diffraction peak corresponding to a rhombohedral phase, and a third diffraction peak corresponding to a phase different from the tetragonal phase and the rhombohedral phase.
Dependencies are inferred from the claim text.