Coating compositions for photolithography
AssigneeRohm and Haas Electronic Materials LLC
InventorsAnthony Zampini, Michael K. Gallagher, Vipul Jain, Owendi Ongayi
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Abstract
Underlying coating compositions are provided that comprise one or more resins comprising one or more modified imide groups. These coating compositions are particularly useful as antireflective layers for an overcoated photoresist layer. Preferred systems can be thermally treated to increase hydrophilicity of the composition coating layer to inhibit undesired intermixing with an overcoated organic composition layer, while rendering the composition coating layer removable with aqueous alkaline photoresist developer.
Claims10
A method of preparing an electronic device, comprising:
- applying an organic composition on a substrate, the organic composition comprise one or more resins with modified imide groups;
- and
- applying a further composition above the organic composition.
The method of any one of claim 1 through 6 wherein the further composition layer is a photoresist composition, a lift-off composition, a passivation composition or a hardmask composition.
A coated substrate comprising:
- an organic composition on a substrate, the organic composition comprise one or more resins with modified imide groups;
- and
- a further composition layer above the organic composition.
An underlying coating composition comprising one or more resins comprising one or more modified imide groups.
Dependencies are inferred from the claim text.