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AssigneeASML Netherlands B.V.
InventorsHernes Jacobs, Noud Jan Gilissen, Hans Jansen, Nicolaas Ten Kate, Nicolaas Kemper, Martinus Hendrikus Antonius Leenders, Erik Roelof Loopstra, Johannes Mulkens, Harmen Klaas Van Der Schoot, Marco Koert Stavenga, Bob Streefkerk, Peter-Paul Steijaert, Marcus Vermeulen, Jacco Van Der Hoeven
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An immersion lithographic projection apparatus is disclosed in which a liquid removal system surrounds a liquid supply system which provides liquid to a space between a projection system and a substrate. The liquid removal system is moveable relative to the liquid supply system and is controlled to have substantially zero velocity relative to the moving substrate table. The gap between the liquid supply system and the liquid removal system may be covered and the atmosphere between the liquid supply system and the liquid removal system above the substrate table may be maintained such that the vapor pressure of liquid is relatively high.
A lithographic projection apparatus, comprising:
A lithographic projection apparatus, comprising:
A lithographic projection apparatus, comprising:
A device manufacturing method comprising pre-wetting a substrate prior to projecting a patterned beam of radiation using a projection system onto the substrate through a liquid, wherein liquid leaks from a space between the projection system and the substrate to cover the substrate.
A device manufacturing method comprising projecting a patterned beam of radiation using a projection system onto the substrate through a liquid, wherein liquid leaks from a space between the projection system and the substrate to cover the substrate and the liquid comprises an additive for lowering the contact angle of the liquid on the substrate.
A device manufacturing method comprising projecting a patterned beam of radiation onto a substrate through a liquid wherein the liquid is supplied by a liquid supply system and any liquid escaping from the liquid supply system is removed by a liquid removal system which surrounds the liquid supply system and moves relative to the liquid supply system.
A device manufacturing method comprising projecting a patterned beam of radiation using a projection system through a liquid onto a substrate, wherein a sealing device surrounds the substrate and seals liquid on a surface of the substrate, a substrate table holding the substrate, or both, and wherein the sealing device is moved relative to the substrate table so that, during at least some movements of the substrate table, the relative velocity between the substrate table and the sealing device is reduced over the relative velocity which would exist if the sealing device remained stationary relative to the projection system.
A device manufacturing method comprising projecting a patterned beam of radiation through a liquid onto a substrate, wherein the liquid is provided using a liquid supply system and a space radially outwardly of the liquid supply system is enclosed and maintained at a high vapor pressure of liquid.
Dependencies are inferred from the claim text.