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US 2007/0190430 A1Published application
Photo-mask stage
OwnerHeng-Chung Wu, Ying-Ming Wuinventors
Life of this patent
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Abstract
A photo-mask stage of an exposure apparatus includes a fixed component to fix a first photo-mask, an exchanging component, which is able to assemble or to disassemble with the fixed component for fixing a second photo-mask.
Claims10
A photo-mask stage comprising:
- a hollowed board having a first part to place a first photo-mask;
- at least a fixed component on the hollowed board to fix the first photo-mask;
- and
- an exchanging component is capable of being assembled and disassembled in the first part, the exchanging component comprising a second part for placing a second photo-mask.
1 more element
Dependencies are inferred from the claim text.