Substrate treatment system, substrate treatment method, and computer readable storage medium

A substrate treatment method for forming a resist pattern on a substrate, comprising at least a coating treatment of applying a resist solution to the substrate, a substrate developing treatment, and a substrate heat treatment,

• wherein at least any of said coating treatment, developing treatment, and heat treatment is performed by transferring the substrate in order to a plurality of treatment units where the treatment is dividedly performed.

The substrate treatment method as set forth in clam 7,

• wherein the treatment dividedly performed in the plurality of treatment units comprises the coating treatment, and
• wherein, in the coating treatment, a discharge treatment of discharging the resist solution onto the substrate, a spread treatment of rotating the substrate to spread the resist solution over the substrate, and a drying treatment of drying the substrate are performed in the respective treatment units.

The substrate treatment method as set forth in clam 8,

• wherein a treatment of removing the resist solution at a peripheral portion of the substrate is performed in the treatment unit for performing the drying treatment.

The substrate treatment method as set forth in clam 7,

• wherein said treatment dividedly performed in the plurality of treatment units comprises the developing treatment, and
• wherein, in the developing treatment, a developing solution supply treatment of supplying a developing solution to the substrate, a cleaning solution supply treatment of supplying a cleaning solution onto the substrate, and a drying treatment of drying the substrate are performed in the respective treatment units.

The substrate treatment method as set forth in clam 7,

• wherein the treatment dividedly performed in the plurality of treatment units comprises the heat treatment, and
• wherein the heat treatment is performed in a plurality of heat treatment units for heating the substrate at the same temperature.

A computer readable storage medium storing a computer program when performing treatments for a substrate using a substrate treatment system,

• wherein said treatment for the substrate comprises at least a coating treatment of applying a resist solution to the substrate, a substrate developing treatment, and a substrate heat treatment, and
• wherein at least any of said coating treatment, developing treatment, and heat treatment is performed by transferring the substrate in order to a plurality of treatment units where the treatment is dividedly performed.