Ion beam irradiation apparatus and ion beam irradiation method

An ion beam irradiation apparatus comprising:

• a vacuum chamber which is to be evacuated to a vacuum;
• an ion source which is disposed inside said vacuum chamber, and which irradiates a substrate to be processed with an ion beam that is larger in width than the substrate;
• a substrate driving mechanism which drives the substrate in said vacuum chamber in a direction that is substantially perpendicular to a width direction of the ion beam emitted from said ion source;
• a rotation shaft which is passed through said vacuum chamber, and a center axis of which is located in a place separated from said ion source toward the substrate, and substantially parallel to a surface of the substrate;
• an arm which is disposed inside said vacuum chamber, and which supports said ion source through said rotation shaft;
• and
• a motor which is disposed outside said vacuum chamber, and which reciprocally rotates said rotation shaft,
• said ion source being supported to be rotatable about said center axis of said rotation shaft.