Coating and developing method, coating and developing system and storage medium

A coating and developing system comprising:

• a first coating unit for coating a substrate with a liquid resist film;
• a second coating unit for coating a surface of the substrate with a protective film forming solution containing a water-repellent material to protect the resist film during an immersion exposure process using a liquid layer;
• a protective film removing unit including a substrate holding device for horizontally holding the substrate, and a chemical solution pouring nozzle for pouring a chemical solution for removing the protective film onto the surface of the substrate processed by an immersion exposure process that forms a liquid layer over the resist film and held by the substrate holding device;
• a heating unit for heating the substrate by a heating process after the protective film has been removed from the substrate;
• and
• a developing unit for processing the substrate by a developing process after the substrate has been processed by the heating process.