Mask film formation method and mask film formation apparatus

A mask film formation apparatus for forming a film on a substrate through an opening in a mask with the mask being closely adhered to the substrate, the apparatus comprising:

• a substrate supporting means for supporting the substrate in a state that the substrate is bent in a convex fashion;
• and
• a mask supporting means for supporting the mask,
• wherein, in the state that the substrate is bent in a convex fashion, the substrate supporting means and the mask supporting means are made to approach each other, a ridge-line portion of the substrate and the mask are brought into contact with each other, and then the substrate and the mask are closely adhered to each other.

A mask film formation apparatus for forming a film on the substrate through an opening with the mask being closely adhered to the substrate, the apparatus comprising:

• a mask support means for supporting the mask;
• a mask pressing means, capable of moving forward and backward, for bending the mask supported by the mask support means in a convex fashion;
• and
• a substrate supporting means for supporting the substrate,
• wherein, in a state that the mask is bent in a convex fashion by the mask pressing means, the substrate support means and the mask support means are made to approach each other and a ridge-line portion of the mask and the substrate are brought into contact with each other, and then the substrate and the mask are closely adhered to each other.