Method for cleaning a thin film forming apparatus and method for forming a thin film using the same
OwnerYoung-Sun Kim, Hyeon-Ill Um +3inventors
InventorsYoung-Sun Kim, Hyeon-Ill Um, Hyeon-Su An, Young-Suk Jeong, Hae-Moon Choi
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Abstract
In a method for a thin film forming apparatus, after the deposition of a thin film is completed, a cleaning gas may be introduced repeatedly into an interior of a process chamber for predetermined intervals. The method may be performed without a drastic temperature drop in the process chamber in order to remove a thin film layer left in the chamber. A purge gas may introduced into the chamber continuously or alternatively with the cleaning gas.
Claims20
A method for cleaning a thin film forming apparatus, the method comprising:
- supplying a purge gas into a process chamber of the thin film forming apparatus;
- and
- periodically supplying a cleaning gas into the process chamber.
A method for forming a thin film using a thin film forming apparatus, the method comprising:
- supplying a first reaction gas and a second reaction gas into a process chamber of the thin film forming apparatus to form a thin film;
- stopping the supplying of the first reaction gas;
- and
- periodically supplying a cleaning gas into the process chamber.
Dependencies are inferred from the claim text.