Developing apparatus and developing method
AssigneeDainippon Screen Mfg. Co., Ltd.
InventorsTsuyoshi Mitsuhashi, Kenji Sugimoto
Life of this patent
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Abstract
A joint nozzle that delivers a developer, a rinsing liquid and nitrogen gas is disposed adjacent the spin center of a substrate in plan view. A controller operates electromagnetic switch valves to continue supply of the developer, while spinning the substrate, in a developing process, and to start supply of the rinsing liquid in a rinsing process, immediately after the supply of the developer ends, thereby achieving a shortened period of the developing process. A switching is made to a drying process by starting supply of the nitrogen gas immediately after completion of the rinsing process. Thus, even if the substrate has a large angle of contact, formation of droplets of the rinsing liquid is inhibited to prevent post-develop defects.
Claims20
A developing apparatus for developing a substrate, comprising:
- a spin-support device for rotatably supporting the substrate;
- a developer nozzle for supplying a developer to the substrate;
- a rinsing liquid nozzle for supplying a rinsing liquid to the substrate;
- an inert gas nozzle for supplying an inert gas to the substrate;
- and
- a control device for controlling spinning of the substrate and supply of the developer, the rinsing liquid and the inert gas;
- wherein said rinsing liquid nozzle and said inert gas nozzle are juxtaposed in a position adjacent a spin center of the substrate in plan view, and
- said control device starts supplying the inert gas to adjacent the spin center after supplying the rinsing liquid to adjacent the spin center of the substrate being spun, and while a film of the rinsing liquid is present on the substrate.
A developing apparatus for developing a substrate, comprising:
- a spin-support device for rotatably supporting the substrate;
- a developer nozzle for supplying a developer to the substrate;
- a rinsing liquid nozzle for supplying a rinsing liquid to the substrate;
- an inert gas nozzle for supplying an inert gas to the substrate;
- and
- a control device for controlling spinning of the substrate and supply of the developer, the rinsing liquid and the inert gas;
- wherein said rinsing liquid nozzle and said inert gas nozzle are juxtaposed as directed to adjacent a spin center of the substrate, and
- said control device starts supplying the inert gas to adjacent the spin center after supplying the rinsing liquid to adjacent the spin center of the substrate being spun, and while a film of the rinsing liquid is present on the substrate.
A developing apparatus for developing a substrate, comprising:
- a spin-support device for rotatably supporting the substrate;
- a developer nozzle for supplying a developer to the substrate;
- a rinsing liquid nozzle for supplying a rinsing liquid to the substrate;
- an inert gas nozzle for supplying an inert gas to the substrate;
- and
- a control device for controlling spinning of the substrate and supply of the developer, the rinsing liquid and the inert gas;
- wherein said developer nozzle and said rinsing liquid nozzle are juxtaposed in a position adjacent a spin center of the substrate in plan view, and
- said control device is arranged, while spinning the substrate, to switch instantly from the supply of the developer to adjacent the spin center to the supply of the rinsing liquid to adjacent the spin center.
A developing method for developing a substrate, comprising the steps of:
- developing the substrate by supplying a developer to the substrate;
- rinsing the substrate by spinning the substrate while supplying a rinsing solution to the substrate;
- and
- drying the substrate by starting supply of an inert gas to adjacent a spin center of the substrate after finishing the rinsing step and while a film of the rinsing liquid is present on the substrate.
Dependencies are inferred from the claim text.