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OwnerOsamu Tamada, Masakazu Sanada +1inventors
InventorsOsamu Tamada, Masakazu Sanada, Tomohiro Goto
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A substrate is first spin-coated with an antireflection film material is carried out to the substrate to form antireflection film on the substrate. Next, a mixed solvent of HMDS and xylene is supplied in a predetermined quantity to the upper surface of the antireflection film, and is spin-dried in this state. The mixed solvent effects surface modifying treatment to reduce a hydrogen bonding component of surface energy of the antireflection film. Subsequently, the substrate receives heat treatment. This completes formation of the antireflection film on the substrate. As a result, the antireflection film has increased adhesion energy in water with respect to resist film, without impairing essential characteristics of the antireflection film.
An antireflection film forming method for forming antireflection film on a substrate in advance of applying a resist solution to the substrate, said method comprising:
A substrate treating apparatus for forming antireflection film on a substrate in advance of applying a resist solution to the substrate, said apparatus comprising:
A substrate treating apparatus for forming antireflection film on a substrate in advance of applying a resist solution to the substrate, said apparatus comprising:
A substrate treating apparatus for forming antireflection film on a substrate in advance of applying a resist solution to the substrate, said apparatus comprising:
A substrate treating apparatus for forming antireflection film on a substrate in advance of applying a resist solution to the substrate, said apparatus comprising:
Dependencies are inferred from the claim text.