Lithographic apparatus and device manufacturing method

A lithographic apparatus comprising:

• a support constructed to hold a patterning device;
• an actuator configured to excite the patterning device;
• and
• a control unit configured to control the actuator,
• wherein the control unit is arranged to drive the actuator to excite the patterning device by a substantially dynamic force to enable a micro-slipping of the patterning device, prior to aligning the patterning device.

A device manufacturing method, comprising:

• applying a substantially stationary force to hold a patterning device on a support;
• testing the holding of the patterning device on the support;
• aligning the patterning device;
• and
• transferring a pattern of the patterning device onto the substrate,
• wherein the testing comprises:
• measuring a position of the patterning device with respect to the support;
• applying to the patterning device a substantially planar force;
• and
• gradually increasing the planar force until a displacement of the patterning device with respect to the support is measured.

A device manufacturing method, comprising:

• applying a substantially stationary force to maintain a substrate on a substrate table;
• exciting the substrate by a substantially dynamic force to enable a micro-slipping of the substrate;
• aligning the substrate;
• and
• transferring a pattern of a patterning device onto the substrate.

A lithographic apparatus comprising:

• a substrate table constructed to hold a substrate;
• an actuator configured to excite the substrate;
• and
• a control unit configured to control the actuator,
• wherein the control unit is arranged to drive the actuator to excite the substrate by a substantially dynamic force to enable a micro-slipping of the substrate, prior to aligning the substrate.