Exposure apparatus and device manufacturing method
AssigneeNikon Corporation
InventorMakoto Shibuta
Life of this patent
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Abstract
An exposure apparatus which prevents the damage due to the liquid having flowed out from spreading and enables satisfactory performances of the exposure processes and the measurement processes is provided. An exposure apparatus (EX) includes a movable table (PT), a base member (41) having an upper surface (41A) that guides the movement of the table (PT), and a detecting device (60) that detects whether there is a liquid on the upper surface (41A) of the base member (41).
Claims38
An exposure apparatus that exposes a substrate via a liquid, comprising:
- a movable table;
- a base member having an upper surface that guides the movement of the table;
- and
- a detecting device that detects whether there is a liquid on the upper surface of the base member.
An exposure apparatus that exposes a substrate via a liquid, comprising:
- a detecting device that can detect a liquid;
- and
- a movable member that is movable while supporting the detecting device.
A device manufacturing method, comprising:
- exposing a substrate via a liquid by use of an exposure apparatus which includes:
- a movable table;
- a base member having an upper surface that guides the movement of the table;
- and
- a detecting device that detects whether there is a liquid on the upper surface of the base member.
A device manufacturing method, comprising:
- exposing a substrate via a liquid by use of an exposure apparatus which includes:
- a detecting device that can detect liquid;
- and
- a movable member that is movable while supporting the detecting device.
Dependencies are inferred from the claim text.