Lithographic apparatus and device manufacturing method
AssigneeASML Netherlands B.V.
InventorPetrus Marinus Van De Biggelaar
Life of this patent
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Abstract
A lithographic apparatus includes a first control system to control a first physical quantity in the lithographic apparatus. A parameter in the first control system is dependent on a value of a further physical quantity in the lithographic apparatus. The parameter may be included in a feedforward path. An input of the feedforward path may be connected to a second control system, the second control system to control a second physical quantity in the lithographic apparatus. The feedforward path may provide a feedforward signal to the first control system in dependency on a signal in the second control system. The further physical quantity may include the second physical quantity.
Claims32
A lithographic apparatus comprising a first control system to control a first physical quantity in the lithographic apparatus, a gain factor parameter in the first control system being dependent on a value of a further physical quantity in the lithographic apparatus.
A device manufacturing method comprising:
- transferring a pattern from a patterning device onto a substrate by a lithographic apparatus,
- controlling with a first control system a first physical quantity in the lithographic apparatus, a gain factor parameter in the first control system being dependent on a value of a further physical quantity in the lithographic apparatus.
Dependencies are inferred from the claim text.