Projection exposure mask acceptance decision system, projection exposure mask acceptance decision method, method for manufacturing semiconductor device, and computer program product

A projection exposure mask acceptance decision method comprising:

• measuring a plurality of quality assurance objects relating to a projection exposure mask;
• calculating a first exposure characteristic deterioration quantity caused by deviations in average values of the plurality of quality assurance objects measured by the assurance object measuring unit;
• calculating a second exposure characteristic deterioration quantity caused by dispersion in the plurality of quality assurance objects which measured by the assurance object measuring unit;
• calculating a simple sum of the first exposure characteristic deterioration quantity and the second exposure characteristic deterioration quantity;
• calculating a root sum square of the first exposure characteristic deterioration quantity and the second exposure characteristic deterioration quantity;
• calculating an entire exposure characteristic deterioration quantity as an interior division value of the simple sum and the root sum square;
• and
• judging whether the entire exposure characteristic deterioration quantity is an acceptable value.

A computer program product configured to store program instructions for execution on a computer system enabling the computer system to perform:

• an instruction for measuring a plurality of quality assurance objects relating to a projection exposure mask;
• an instruction for calculating a first exposure characteristic deterioration quantity caused by deviations in average values of the plurality of quality assurance objects which have been measured by the assurance object measuring unit;
• an instruction for calculating a second exposure characteristic deterioration quantity caused by dispersion in the plurality of quality assurance objects which have been measured by the assurance object measuring unit;
• an instruction for calculating a simple sum of the first exposure characteristic deterioration quantity and the second exposure characteristic deterioration quantity;
• an instruction for calculating a root sum square of the first exposure characteristic deterioration quantity and the second exposure characteristic deterioration quantity;
• an instruction for calculating an entire exposure characteristic deterioration quantity as an interior division value of the simple sum and the root sum square;
• and
• an instruction for judging whether the entire exposure characteristic deterioration quantity is an acceptable value.