Sputtering apparatus and anti-adhesion plate therefor
AssigneeSeiko Epson Corporation
InventorNaoto Nishimura
Life of this patent
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AssigneeSeiko Epson Corporation
InventorNaoto Nishimura
Estimating the term…
A sputtering apparatus includes a first cover surrounding a periphery of a target, having a first opening through which sputtered particles from the target are emitted, and being made of a conductive material; a second cover having a second opening through which the sputtered particles from the target are adhered onto a substrate, the second cover being made of a conductive material; an O-ring placed between the first cover and the second cover to allow the first opening and the second opening to communicate with each other via a hollow center portionof the O-ring, the O-ring being made of an insulating material; and a third cover placed via an insulating material over a face of at least one of the first cover and the second cover facing the O-ring, the third cover being made of a conductive material.
A sputtering apparatus comprising:
Dependencies are inferred from the claim text.