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US 2007/0181256 A1Published application
Plasma processing unit
OwnerMasaru Sugata, Akira Itani +2inventors
InventorsMasaru Sugata, Akira Itani, Akihito Isobe, Kenichi Shomura
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OwnerMasaru Sugata, Akira Itani +2inventors
InventorsMasaru Sugata, Akira Itani, Akihito Isobe, Kenichi Shomura
Estimating the term…
A plasma processing unit includes: a processing chamber (10); a first electrode (5) and a second electrode (11) which are placed in the processing chamber (10) and arranged to face each other; and a quartz plate (13) arranged on one of the surfaces of the first electrode (5) facing the second electrode (11) to protect the first electrode (5), the plasma processing unit being configured to excite reaction gas in the processing chamber (11) to generate plasma between the first electrode (5) and the second electrode (11) so that a target object placed on one of the surfaces of the second electrode (11) facing the first electrode (5) is subjected to plasma processing, wherein one of the surfaces of the quartz plate (13) facing the second electrode (11) is rough-finished.
A plasma processing unit comprising:
Dependencies are inferred from the claim text.