Gas supply system, substrate processing apparatus and gas supply method

A gas supply system for supplying a gas into a processing chamber for processing a substrate to be processed, the system comprising:

• a processing gas supply unit for supplying a processing gas for processing the substrate to be processed;
• a processing gas supply line for allowing the processing gas from the processing gas supply unit to flow therein;
• a first to an n-th branch line branched from the processing gas supply line to be respectively connected with a first to an n-th gas introduction section for introducing a gas from different portions in the processing chamber;
• a branch flow control unit for controlling branch flows of the processing gas distributed from the processing gas supply line to the first to the n-th branch line based on pressures in the first to the n-th branch line;
• an additional gas supply unit for supplying an additional gas;
• and
• an additional gas supply line for allowing the additional gas to flow therein,
• wherein at least one of the first to the n-th gas introduction section is divided into a processing gas introduction section for introducing the processing gas from the branch lines into the processing chamber and an additional gas introduction section for introducing the additional gas from the additional gas supply line into the processing chamber to be added to the processing gas.

A gas supply system for supplying a gas into a processing chamber for processing a substrate to be processed, the system comprising:

• a processing gas supply unit for supplying a processing gas for processing the substrate to be processed;
• a processing gas supply line for allowing the processing gas from the processing gas supply unit to flow therein;
• a plurality of branch lines branched from the processing gas supply line to be respectively connected with a plurality of gas introduction sections for introducing a gas from different portions in the processing chamber;
• a branch flow control unit for controlling branch flows of the processing gas distributed from the processing gas supply line to the branch lines based on inner pressures of the branch lines;
• an additional gas supply unit for supplying an additional gas;
• and
• an additional gas supply line for allowing the additional gas to flow therein,
• wherein at least one of the gas introduction sections is divided into a processing gas introduction section for introducing the processing gas from the branch lines into the processing chamber and an additional gas introduction section for introducing the additional gas from the additional gas supply line to be added to the processing gas.

A substrate processing apparatus comprising:

• a processing chamber for processing a substrate to be processed;
• and
• a gas supply system for supplying a gas into the processing chamber,
• wherein the gas supply system comprises a first and a second gas introduction section for introducing a gas from different portions in the processing chamber;
• a processing gas supply unit for supplying a processing gas for processing the substrate to be processed;
• a processing gas supply line for allowing the processing gas from the processing gas supply unit to flow therein;
• a first and a second branch line branched from the processing gas supply line to be respectively connected with the first and the second gas introduction section;
• a branch flow control unit for controlling branch flows of the processing gas distributed from the processing gas supply line to the first and the second branch line based on pressures in the first and the second branch line;
• an additional gas supply unit for supplying an additional gas;
• an additional gas supply for allowing the additional gas from the additional gas supply unit to flow therein,
• wherein the first gas introduction section or the second gas introduction section is divided into a processing gas introduction section connected with the branch lines and an additional gas introduction section connected with the additional gas supply line.

A gas supply method using a gas supply system for supplying a gas into a processing chamber for processing a substrate to be processed, the gas supply system including a processing gas supply unit for supplying a processing gas for processing the substrate to be processed;

• a processing gas supply line for allowing the processing gas from the processing gas supply unit to flow therein;
• a first and a second branch line branched from the processing gas supply line to be respectively connected with a first and a second gas introduction section for introducing a gas from different portions in the processing chamber;
• a branch flow control unit for adjusting branch flows of the processing gas distributed from the processing gas supply line to the first and the second branch line based on pressures in the first and the second branch line;
• an additional gas supply unit for supplying an additional gas;
• and an additional gas supply line for allowing the additional gas from the additional gas supply unit to flow therein, wherein the first gas introduction section or the second gas introduction section is divided into a processing gas introduction section connected with the branch lines and an additional gas introduction section connected with the additional gas supply line, the method comprising the steps of:
• controlling, before processing the substrate to be processed, the processing gas supply unit and the additional gas supply unit to initiate supplies of the processing gas and the additional gas;
• and
• controlling the branch flow control unit to adjust the branch flows of the processing gas such that a ratio of the pressure in the branch lines becomes a target pressure ratio