Apparatus including an improved nozzle unit

Abstract

An apparatus for supplying a solution to a substrate includes a nozzle unit. The nozzle unit may include at least one nozzle having a variable structure in which lateral portions of the at least one nozzle are bent toward a central portion of the at least one nozzle. Each nozzle of the nozzle unit may include a hinged connecting member disposed at the central portion of each of the nozzles. The hinge angles between lateral portions of each of the nozzles may vary during operation. Each of the nozzles may include a plurality of spray holes for uniformly providing a developing solution onto the photoresist film. Some of the plurality of holes positioned near the central portion of the nozzles may be substantially wider than some of the plurality of holes positioned near lateral portions of the nozzles.

Dependencies are inferred from the claim text.