Lithographic apparatus and device manufacturing method

A lithographic apparatus comprising:

• an illumination system configured to condition a radiation beam;
• a patterning device support constructed to hold a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam;
• a substrate table constructed to hold a substrate;
• a projection system configured to project the patterned radiation beam onto a target portion of the substrate, and
• two or more types of clamping devices that are configured to exert a clamping force on substantially overlapping areas of a side of said patterning device.

A device manufacturing method comprising:

• holding a patterning device with a patterning device support;
• patterning a beam of radiation with the patterning device to form a patterned beam of radiation;
• and
• projecting the patterned beam of radiation onto a substrate,
• wherein said holding includes clamping the patterning device at a top side thereof to an underside of the patterning device support.