Method for fabricating micrometer or nanometer channels
AssigneeMax-Plank-Gesellschaft zur Förderung der Wissenschaften e.V.
InventorsOliver G. Schmidt, Yongfeng Mei, Dominic Thurmer, Francesca Cavallo
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Abstract
Thin films, which are deposited on a sacrificial film on a substrate, are released and bonded back on a substrate surface. This technology provides open and closed 2D confined micro-/nano-channels and channel networks on a substrate surface. The geometry, size and complexity of the channels and channel networks can be modified by the film and substrate properties as well as the treatment techniques of the sacrificial layer etching. A method to fabricate such structures with position- and pattern-controllability is provided.
Claims9
A method of fabricating at least one micrometer or nanometer channel, the method comprising the steps of
- a) providing a layered structure including a substrate, a sacrificial layer on top of the substrate, and a compressively strained functional layer on top of the sacrificial layer,
- b) selectively removing at least a portion of the sacrificial layer between the substrate and the functional layer.
The method according to one of the preceding claims, wherein step a) comprises selecting a first crystalline material for the sacrificial layer and a second crystalline material for the functional layer, wherein the second crystalline material has a higher lattice constant than the first crystalline material and the functional layer is grown epitaxially onto the sacrificial layer so that the functional layer is in a compressively strained state.
Dependencies are inferred from the claim text.