Coating compositions for use with an overcoated photoresist
AssigneeRohm and Haas Electronic Materials LLC
InventorsVaishali Raghu Vohra, James W. Thackeray, Gerald B. Wayton
Life of this patent
Estimating the term…
Abstract
Underlying coating compositions are provided for use with an overcoated photoresist composition. In one aspect, the coating composition can be crosslinked and comprise one or more components that contain one or more acid-labile groups and/or one or more base-reactive groups that are reactive following crosslinking. In another aspect, underlying coating composition are provided that can be treated to provide a modulated water contact angle. Preferred underlying coating compositions can exhibit enhanced etch rates in plasma etchants. Additional preferred coating compositions can enhance lithographic performance of an associated photoresist composition.
Claims10
A coated substrate comprising:
- a coating composition layer that can be treated to provide a different water contact angle;
- and
- a photoresist layer over the coating composition layer.
A coated substrate comprising:
- a crosslinkable coating composition layer comprising one or more components that comprise one or more acid-labile groups and/or one or more base-reactive groups;
- and
- a photoresist layer over the coating composition layer.
A method of forming a photoresist relief image, comprising:
- applying a coating composition on a substrate, the applied composition can be treated to provide a different water contact angle;
- applying a photoresist composition above the coating composition layer;
- and
- exposing and developing the photoresist layer to provide a resist relief image.
A crosslinkable antireflective composition for use with an overcoated photoresist composition, the antireflective composition comprising one or more components that comprise one or more acid-labile groups and/or one or more base-reactive groups.
Dependencies are inferred from the claim text.