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US 2007/0178404 A1Published application
Methods of preventing defects in antireflective coatings
AssigneeInternational Business Machines Corporation
InventorsColin J. Brodsky, Mary Jane Brodsky, Wai-Kin Li, Steven A. Scheer
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Abstract
A method of forming a relief image on a substrate including: applying over a substrate a layer of an antireflective coating; and vacuum processing the antireflective coating. This method reduces the number of pinhole defects present in the antireflective coating.
Claims13
A method of forming a relief image on a substrate comprising:
- applying over a substrate a layer of an antireflective coating;
- and
- vacuum processing the antireflective coating prior to curing.
Dependencies are inferred from the claim text.