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US 2007/0177135 A1Published application
Method and system for measurement data evaluation in semiconductor processing by correlation-based data filtering
AssigneeAdvanced Micro Devices, Inc.
InventorGarry Tuohy
Life of this patent
Estimating the term…
Abstract
By performing a contingency-based correlation test of measurement data, such as defect data, with respect to electrical test data after progressively filtering the measurement data, an enhanced analysis of process flow characteristics may be accomplished. Consequently, an efficient yield loss estimation may be performed.
Claims26
A method, comprising:
- obtaining a first set of measurement data from a plurality of positions of a substrate having formed thereon a plurality of semiconductor devices at a first manufacturing stage;
- obtaining a second set of measurement data from said plurality of positions of said substrate at a second manufacturing stage;
- filtering said first set of measurement data on the basis of a first filter criterion to obtain first filtered measurement data for each of said plurality of positions;
- and
- determining a first degree of correlation of said first filtered measurement data with said second set of measurement data.
2 more elements
A method, comprising:
- progressively filtering a first set of measurement data obtained from a plurality of positions of a substrate having formed thereon a plurality of semiconductor devices at a first manufacturing stage so as to generate a plurality of sets of progressively filtered measurement data;
- obtaining a second set of measurement data from said plurality of positions of said substrate at a second manufacturing stage;
- and
- combining said second set of measurement data with each of said plurality of sets of progressively filtered measurement data to determine for each of said plurality of sets of progressively filtered measurement data a value of a characteristic of said plurality of sets of progressively filtered measurement data.
1 more element
A system comprising:
- an interface configured to receive a first set of measurement data and a second set of measurement, the first and second sets of measurement data representing measurement data obtained from two different manufacturing stages of a substrate comprising a plurality of semiconductor devices;
- a filter unit connected to said interface and configured to automatically extract one or more sets of filtered measurement data from said first set of measurement data;
- and
- a correlation unit connected to said filter unit and configured to determine a degree of correlation between said one or more sets of filtered measurement data and said second set of measurement data.
1 more element
Dependencies are inferred from the claim text.