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AssigneesASML Netherlands B.V., Carl Zeiss SMT GmbH
InventorsErik Loopstra, Adrianus Engelen, Bernardus Luttikhuis, Maria Rubingh, Johannes Hazenberg, Laurentius Jorritsma, Johannes Klerk, Bernhard Geuppert, Aart Van Beuzekom, Petrus Franciscus Mandigers, Franz Sorg, Peter Deufel
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A lithographic apparatus has an assembly to exchange optical elements in a pupil plane of its projection system. The optical elements may be pupil filters and may conform to the physical dimensions specified for a reticle standard, e.g. having sides substantially equal to 5, 6 or 9 inches.
A lithographic projection apparatus comprising:
A device manufacturing method using a lithographic projection apparatus that includes a pattern support to support a patterning device and a projection system having a pupil plane and arranged to project an image of a pattern of the patterning device onto a substrate, the method comprising:
An exchangeable optical element arranged to be selectively positioned in the pupil plane of the projection system of a lithographic apparatus, the exchangeable optical element having peripheral dimensions that substantially match relevant parts of a standard for patterning devices.
An exchangeable optical element arranged to be selectively positioned in the pupil plane of the projection system of a lithographic apparatus, the exchangeable optical element being not rotationally symmetric.
Dependencies are inferred from the claim text.