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US 2007/0177121 A1Published application
Phase shifting photolithography system
AssigneeChartered Semiconductor Manufacturing Ltd.
InventorsQunying Lin, Sia Kim Tan, Liang-Choo Hsia
Life of this patent
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Abstract
A phase shifting photolithography system includes inserting a phase shift component in a path of an illumination, wherein the phase shift component modifies a portion of the of the illumination to a different, and controlling an aperture shutter of the phase shift component modifying an interference of the illumination and the illumination with the different phase.
Claims20
A phase shifting photolithography system comprising:
- inserting a phase shift component in a path of an illumination, wherein the phase shift component modifies a portion of the of the illumination to a different phase;
- and
- controlling an aperture shutter of the phase shift component modifying an interference of the illumination and the illumination with the different phase.
A phase shifting photolithography system comprising:
- inserting a phase shift component in a path of an illumination, wherein the phase shift component modifies a portion of the of the illumination to a different phase of 180 degrees;
- and
- controlling an aperture shutter of the phase shift component modifying magnitudes of the illumination with no phase change and an interference with the illumination with the different phase of 180 degrees.
A phase shifting photolithography system comprising:
- a phase shift component in a path of an illumination, wherein the phase shift component modifies a portion of the of the illumination to a different phase;
- and
- an aperture shutter of the phase shift component to modify an interference of the illumination and the illumination with the different phase.
Dependencies are inferred from the claim text.