Exposure apparatus and device manufacturing method
OwnerKeiji Yamashitainventor
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Abstract
An exposure apparatus for exposing a substrate via liquid includes a supply nozzle configured to supply the liquid, and a recovery nozzle configured to recover the liquid, wherein at least one of the supply nozzle and the recovery nozzle includes porous ceramic with an oxide film.
Claims10
An exposure apparatus for exposing a substrate via liquid, the exposure apparatus comprising:
- a supply nozzle configured to supply the liquid;
- and
- a recovery nozzle configured to recover the liquid, wherein at least one of the supply nozzle and the recovery nozzle includes porous ceramic with an oxide film.
An exposure apparatus for exposing a substrate via liquid, the exposure apparatus comprising a liquid holding plate configured to hold the liquid, the liquid holding plate being arranged around the substrate, and including porous ceramic with an oxide film.
A device manufacturing method comprising:
- exposing a substrate using an exposure apparatus;
- and
- developing the substrate that has been exposed,
- wherein the exposure apparatus includes:
- a supply nozzle configured to supply the liquid;
- and
- a recovery nozzle configured to recover the liquid, wherein at least one of the supply nozzle and the recovery nozzle includes porous ceramic with an oxide film.
Dependencies are inferred from the claim text.