Alignment mark and overlay inspection mark
AssigneeOki Electric Industry Co., Ltd.
InventorSuguru Sasaki
Life of this patent
Estimating the term…
Abstract
An alignment mark is formed on an underlying layer and disposed on a region in which a semiconductor device is not formed. The alignment mark includes a plurality of strip-shaped patterns detectable by an optical imaging device. The patterns have long axes and short axes. The patterns are arranged in a matrix of rows and columns in such a manner that the long axes are substantially perpendicular to the direction of the alignment adjustment.
Claims13
An alignment mark formed on an underlying layer and disposed on a region in which a semiconductor element is not formed,
- said alignment mark comprising a plurality of strip-shaped patterns detectable by an optical imaging device,
- wherein said patterns have long axes and short axes, and said patterns are arranged in a matrix of rows and columns in such a manner that said long axes are substantially perpendicular to the direction of the alignment adjustment.
An overlay inspection mark formed on an underlying layer and disposed on a region in which a semiconductor element is not formed,
- said overlay inspection mark comprising a first mark and a second mark both of which are detectable by an optical imaging device,
- wherein said first mark includes four linear marks each of which includes a plurality of strip-shaped dot marks having long axes and short axes, said dot marks of each of said linear marks being so disposed that said long axes are directed in the same direction,
- wherein said linear marks are disposed on four sides of a square in such a manner that two of said linear marks face parallel to each other across a center point of said square, and the other two of said linear marks face parallel to each other across said center point, and
- wherein said second mark has a shape and a size that enable the measurement of a positional relationship between said first mark and said second mark.
Dependencies are inferred from the claim text.