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US 2007/0175753 A1Published application
AlRu Sputtering Target and Manufacturing Method thereof
AssigneeNippon Mining & Metals Co., Ltd.
InventorAkira Hisano
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Abstract
An AlRu sputtering target that is a sintered body composed of an AlRu intermetallic compound of 95 vol.% or more is provided. It is manufactured by a stable and low-cost method that provides it with an even texture, significantly reduces oxygen, prevents or suppresses the generation of particles, and improves the yield ratio of deposition goods.
Claims16
A method of manufacturing an AlRu sputtering target, comprising the steps of:
- performing high frequency dissolution to raw materials Al and Ru;
- forming an ingot from said raw materials after said dissolution;
- preparing a first powder from said ingot, said first powder having as a principal component an Al13Ru4 intermetallic compound, said step of preparing said first powder from said ingot is accomplished by pulverizing said ingot or by employing a gas atomization method on said ingot;
- mixing Ru powder and said first powder to produce a mixture;
- and
- sintering said mixture by hot pressing or hot isostatic pressing (HIP).
3 more elements
Dependencies are inferred from the claim text.