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US 2007/0175387 A1Published application
Substrate processing apparatus and substrate processing method
OwnerMasahiro Kimurainventor
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OwnerMasahiro Kimurainventor
Estimating the term…
A substrate processing apparatus of the present invention comprises a cooling mechanism for cooling a processing solution and a filter for removing impurities contained in the processing solution, at some midpoint in a circulation path of the processing solution. With this constitution, the substrate processing apparatus can precipitate the impurities dissolved in the processing solution and remove the precipitated impurities. It therefore becomes possible to maintain the performance of the processing solution and reuse the processing solution. Further, the frequency of changing the processing solution to a new solution decreases, and this causes an increase in availability of the substrate processing apparatus and a decrease in consumption and drainage of the processing solution.
A substrate processing apparatus for processing a substrate with a processing solution, comprising:
A substrate processing apparatus for processing a substrate with a processing solution, comprising:
A substrate processing method for processing a substrate with a processing solution, comprising the steps of:
Dependencies are inferred from the claim text.